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High mobility hole gas and valence-band offset in modulation-doped <i>p</i>-AlGaAs/GaAs heterojunctions
179
Citations
10
References
1984
Year
SemiconductorsSemiconductor TechnologyElectrical EngineeringEngineeringPhysicsApplied PhysicsQuantum MaterialsAluminum Gallium NitrideIii-v Compound SemiconductorsMolecular Beam EpitaxyValence-band OffsetCategoryiii-v SemiconductorCompound SemiconductorModulation-doped P-algaas/gaas Heterojunctions
Modulation-doped p-AlGaAs/GaAs heterojunctions have been grown by molecular beam epitaxy. The effects of undoped AlGaAs spacer thickness on sheet carrier density and on Hall mobility have been investigated. A mobility of 97 000 cm2 V−1 s−1 has been obtained at 4.2 K for a sheet density of 1.7×1011 cm−2. This is the highest mobility reported for holes in III-V compound semiconductors. A valence-band offset of 210±30 meV was deduced for Al0.5Ga0.5As /GaAs heterojunctions.
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