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Radiative and nonradiative recombination processes in InN films grown by metal organic chemical vapor deposition
37
Citations
12
References
2005
Year
Optical MaterialsEngineeringOptoelectronic DevicesIndium NitrideChemical DepositionLuminescence PropertySemiconductorsNonradiative RecombinationRadiation GenerationPulsed Laser DepositionCompound SemiconductorThin Film ProcessingMaterials SciencePhotonicsPhotoluminescence BandPhotoluminescencePhysicsOptoelectronic MaterialsComposite Photoluminescence FeatureSolid-state LightingInn FilmsSurface ScienceApplied PhysicsOptoelectronicsChemical Vapor Deposition
The 800meV photoluminescence band in indium nitride is excited under pulsed excitation conditions and is investigated as a function of temperature and time. Our results are consistent with a composite photoluminescence feature composed of two overlapping bands separated by an ∼10meV splitting, with populations described by a thermal equilibrium model. Efficient nonradiative recombination channels rule both the temperature dependence of the time-integrated photoluminescence spectra and the recombination dynamics. At 10K, the radiative recombination time is of the order of 300ns, while the nonradiative recombination time, which is ruled by activation energy of 8meV, is about 100ps.
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