Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor - Concepedia

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Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor

17

Citations

6

References

1999

Year

A. Hofrichter, Pavel Bulkin, B. Drévillon

Applied Surface Science

Chemical EngineeringEngineeringApplied PhysicsChemical Vapor DepositionChemistryChemical VapourChemical DepositionChemical KineticsPlasma Processing

References

	Year	Citations

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