Plasma enhanced chemical vapour deposition of SiOxNy in an integrated distributed electron cyclotron resonance reactor

Electron cyclotron resonance microwave discharges for etching and thin-film deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 361 citations

Engineering, Electrical Engineering, Physics +17

ELECTRON CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN?FILM DEPOSITION

V Asmussen · 1989 · 300 citations

Engineering, Electrical Engineering, Physics +12

Charged particle densities and energy distributions in a multipolar electron cyclotron resonant plasma etching source

Jeffrey Hopwood, D.K. Reinhard, J. Asmussen · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 81 citations

Natural Sciences, Electrical Engineering, Physics +13

Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor

Pavel Bulkin, Nicolas Bertrand, B. Drévillon · Thin Solid Films · 1997 · 33 citations

Engineering, Materials Engineering, Materials Science +10

Distributed electron cyclotron resonance in silicon processing: Epitaxy and etching

Rudolf R. Burke, Jean Pelletier, C. Pomot et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 30 citations

Engineering, Materials Engineering, Materials Science +17