Preparation of perovskite conductive LaNiO3 films by metalorganic decomposition

Abstract

Perovskite conductive LaNiO3 films, 250 nm thick, were prepared by metalorganic decomposition. Rutherford backscattering spectrometry was used to determine the film thickness and composition. The x-ray diffraction patterns of LaNiO3 films indicated that the lowest temperature for crystallization is about 530 °C. The measurement of resistivity as a function of annealing temperatures showed that the good metallic conductive LaNiO3 films could be obtained at 550 °C. The films with the lowest resistivity (4.0×10−4 Ω cm) were obtained on quartz by annealing in oxygen at 700 °C.