Effect of leakage current and dielectric constant on single and double layer oxides in MOS structure - Concepedia

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Effect of leakage current and dielectric constant on single and double layer oxides in MOS structure

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Citations

21

References

2010

Year

Pinaki Laha, Alaka Panda, S.S. Dahiwale, Kalyani Date, K.R. Patil, P.K. Barhai, A. K. Das, Indrani Banerjee, Santosh Kumar Mahapatra

Thin Solid Films

Materials ScienceMaterials EngineeringElectrical EngineeringDielectric ConstantMos StructureEngineeringNanoelectronicsStress-induced Leakage CurrentOxide ElectronicsApplied PhysicsBias Temperature InstabilityIntrinsic ImpurityDouble Layer OxidesSemiconductor MaterialMicroelectronics

References

	Year	Citations

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