Publication | Closed Access
Formation of carbon nitride films by reactive high-density plasma sputtering with excitation of m=0 mode helicon wave
14
Citations
16
References
1999
Year
Materials EngineeringMaterials ScienceEngineeringPhysicsNanoelectronicsSurface ScienceApplied PhysicsGas Discharge PlasmaPlasma ApplicationPlasma ProcessingReactive High-density Plasma
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