Electron temperature control with grid bias in inductively coupled argon plasma

Abstract

The mechanism of controlling electron temperature with grid-biased voltage is studied experimentally and the relevant physics is discussed in an inductively coupled Ar discharge. To obtain the electron density and electron temperature, the electron energy distribution functions (EEDFs) are measured with a Langmuir probe. As the grid voltage decreases negatively, the effective electron temperature is controlled from 2.0 to 0.6 eV and the electron density changes from 3×1010 to 2×1010 cm−3 in the diffusion region, while the effective electron temperature and electron density are not changed in the source region. The dependence of such various parameters, as electron density, electron temperature, plasma potential in each region, and so on, on the applied voltage, is presented. The functional relations between the measured physical quantities are well explained based on a global particle and energy balance relations.