Characterization of TiN films prepared by a conventional magnetron sputtering system: influence of nitrogen flow percentage and electrical properties

Handbook of X-Ray Photoelectron Spectroscopy

J. F. Moulder · Medical Entomology and Zoology · 1995 · 23.7K citations

Natural Sciences, Chemistry, Materials Science +10

The mean free path of electrons in metals

E. H. Sondheimer · Advances In Physics · 1952 · 2.6K citations

Natural Sciences, Mathematics, Physics +14

Photoemission study of the electronic structure of stoichiometric and substoichiometric TiN and ZrN

Hartmut Höchst, R. D. Bringans, P. Steiner et al. · Physical review. B, Condensed matter · 1982 · 208 citations

Natural Sciences, Materials Engineering, Materials Science +17

Growth and properties of single crystal TiN films deposited by reactive magnetron sputtering

B.-O. Johansson, J.‐E. Sundgren, J. E. Greene et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 206 citations

Natural Sciences, Materials Engineering, Materials Science +17

Applications of TiN thin films in silicon device technology

M. Wittmer, H. Melchior · Thin Solid Films · 1982 · 156 citations

Natural Sciences, Materials Engineering, Materials Science +14