Publication | Closed Access
Nanometer Linear Focusing of Hard X Rays by a Multilayer Laue Lens
281
Citations
18
References
2006
Year
Optical MaterialsEngineeringLinear FocusingMicroscopyOptic DesignPolycapillary OpticsX-ray FluorescenceX-ray ImagingBeam OpticOptical PropertiesHard X RaysLaue Diffraction GeometryNanophotonicsHealth SciencesPhotonicsPhysicsSynchrotron RadiationLinear Zone PlateMultilayer LaueX-ray DiffractionApplied PhysicsMultilayer Laue LensX-ray OpticDiffractive Optic
Because of its large optical depth, a multilayer Laue lens spans the diffraction regimes applicable to a thin Fresnel zone plate and a crystal. The authors report a linear zone plate for nanometer‑scale focusing of hard X‑rays—a multilayer Laue lens produced by sectioning a multilayer and illuminating it in Laue diffraction geometry. The MLL is fabricated by sectioning a multilayer and illuminating it in Laue diffraction geometry, and partial structures with outermost zone widths as small as 10 nm have been tested with 19.5 keV synchrotron radiation. Coupled‑wave theory predicts focusing to 5 nm or smaller with high efficiency, and measured focal sizes as small as 30 nm with efficiencies up to 44 % confirm this capability.
We report on a type of linear zone plate for nanometer-scale focusing of hard x rays, a multilayer Laue lens (MLL), produced by sectioning a multilayer and illuminating it in Laue diffraction geometry. Because of its large optical depth, a MLL spans the diffraction regimes applicable to a thin Fresnel zone plate and a crystal. Coupled wave theory calculations indicate that focusing to 5 nm or smaller with high efficiency should be possible. Partial MLL structures with outermost zone widths as small as 10 nm have been fabricated and tested with 19.5 keV synchrotron radiation. Focal sizes as small as 30 nm with efficiencies up to 44% are measured.
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