MOCVD precursors for Ta- and Hf-compound films - Concepedia

Concepedia

Publication | Closed Access

MOCVD precursors for Ta- and Hf-compound films

16

Citations

6

References

2002

Year

H. Machida, A. Hoshino, Takuo SUZUKI, Atsushi Ogura, Yoshio Ohshita

Journal of Crystal Growth

Materials EngineeringMaterials ScienceEngineeringApplied PhysicsMocvd PrecursorsThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film Processing

References

	Year	Citations

Page 1