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Low Threshold Lasing of GaN-Based VCSELs With Sub-Nanometer Roughness Polishing
22
Citations
19
References
2013
Year
EngineeringLaser ApplicationsSurface-emitting LasersHigh-power LasersLaser ControlCavity RegionNanophotonicsSub-nanometer Roughness PolishingPhotonicsPhysicsAluminum Gallium NitrideLow ThresholdLaser DesignLaser-assisted DepositionCategoryiii-v SemiconductorAdvanced Laser ProcessingApplied PhysicsGan Power DeviceLow Threshold LasingOptoelectronics
Low threshold lasing at room temperature was achieved in optically pumped GaN-based vertical-cavity surface-emitting lasers (VCSELs) with sub-nanometer roughness polishing. The cavity region sandwiched by two dielectric distributed Bragg reflectors, incorporating InGaN/GaN multiquantum wells, a p-type AlGaN layer, and n- and p-type GaN layers, is a typical structure for electrically driven VCSELs. We observed lasing at a wavelength of 431.0 nm with a low threshold pumping energy density of ~ 3.2 mJ/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> and a high spontaneous emission coupling factor of ~ 0.09. These results were attributed to the significant reduction of the internal cavity loss by the removal of the high-dislocation GaN region, the reduction of cavity length, and the achievement of sub-nanometer level surface roughness (root mean square roughness of 0.3 nm) via inductively coupled plasma etching and chemical mechanical polishing. The loss mechanism is discussed and loss is quantitatively calculated in this letter.
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