Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C - Concepedia

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Properties of a-Si:H films deposited by RF magnetron sputtering at 95°C

12

Citations

11

References

2010

Year

D. Girginoudi, Christos Tsiarapas, N. Georgoulas

Applied Surface Science

EngineeringPhysicsApplied PhysicsRf MagnetronSemiconductor MaterialThin Film Process TechnologyThin FilmsH FilmsThin Film Processing

References

	Year	Citations

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