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Ti O 2 based metal-semiconductor-metal ultraviolet photodetectors
196
Citations
16
References
2007
Year
Optical MaterialsEngineeringPhoto-electrochemical CellOptoelectronic DevicesSemiconductor NanostructuresSemiconductorsPhotodetectorsNanoelectronicsMaterials ScienceElectrical EngineeringPhotoluminescenceHigh ResponsivityOptoelectronic MaterialsSchottky BarrierPhotoelectric MeasurementTi O 2Applied PhysicsThin FilmsDefect TrapsOptoelectronicsSolar Cell Materials
Nanocrystalline TiO2 thin films were prepared by sol-gel method and were then used to fabricate metal-semiconductor-metal ultraviolet photodetectors with Au Schottky contact. It was found that dark current of the fabricated devices was only 1.9nA at 5V applied bias. High responsivity of 199A∕W was achieved when it was irradiated by the ultraviolet light (λ=260nm). The low dark current and high responsivity maybe attributed to the effect of Schottky barrier in company with neutral semiconductor owing to the wide finger gap of 20μm. The devices show a slow time response with a rise time of 6s and a decay time of 15s. The authors deduced that the slow time response was caused by defect traps which were widely distributed in nanocrysal.
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2006 | 91 | |
2002 | 91 |
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