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Some Structural and Optical Properties of CdS Thin Films Prepared by RF Sputtering
27
Citations
15
References
2000
Year
Materials ScienceSemiconductorsIi-vi SemiconductorOptical MaterialsCds TargetEngineeringRadio FrequencyOptical PropertiesApplied PhysicsSemiconductor MaterialCds FilmsThin Film Process TechnologyThin FilmsOptoelectronicsChemical Vapor DepositionCompound SemiconductorThin Film ProcessingSolar Cell Materials
Stable CdS thin films were prepared by radio frequency sputtering onto glass substrates from a CdS target (purity 4N). The as-grown films were thermally annealed under vacuum at 100 and 150 °C. The effect of the annealing temperatures on the structural and optical properties of the films was investigated. Grazing incidence X-ray diffraction (GIXD) studies show that the CdS films annealed at 150 °C were continuous and homogeneous as opposed to the as-deposited and the films annealed at 100 °C.
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