Publication | Closed Access
Plasma enhanced chemical vapor deposition of SiO2 films at low temperatures using SiCl4 and O2
16
Citations
8
References
1990
Year
Materials ScienceLow TemperaturesEngineeringSurface ScienceApplied PhysicsThin FilmsChemical DepositionSio2 FilmsPlasma ProcessingChemical Vapor DepositionSilicon On InsulatorThin Film Processing
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