Interface characterization in electrodeposited Cu–Co multilayers

Abstract

Multilayers of Cu–Co made by electrodeposition are characterized. The interface width and layer roughness are measured by the Fresnel technique in electron microscopy. It is shown that the quality of the interfaces is comparable to that of layers made by physical deposition techniques. By depositing the layers on a glass substrate, we also show that it is possible to measure the magnetoresistance of the multilayers without removing the substrate. The values obtained are discussed in relation to the roughness of the layers and the electrodeposition conditions.