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General mobility and carrier concentration relationship in transparent amorphous indium zinc oxide films
240
Citations
27
References
2008
Year
Optical MaterialsEngineeringThin Film Process TechnologyElectronic PropertiesSemiconductorsQuantum MaterialsIonized ImpurityCharge Carrier TransportThin Film ProcessingMaterials ScienceCarrier Concentration RelationshipPhysicsOxide ElectronicsElectron TransportSemiconductor MaterialGeneral MobilityApplied PhysicsCondensed Matter PhysicsThin FilmsAmorphous Solid
We report the dependence of the electronic properties on the metal composition and oxygen content of transparent conducting amorphous indium zinc oxide $(a\text{\ensuremath{-}}\mathrm{IZO})$ films deposited by dc magnetron sputtering. $a\text{\ensuremath{-}}\mathrm{IZO}$ shows a clear Burstein--Moss shift with an effective optical band gap of $3.1\phantom{\rule{0.3em}{0ex}}\mathrm{eV}$ independent of the metal composition. A metal-composition-independent dependence of the mobility $(\ensuremath{\mu})$ on carrier concentration $(N)$ is also found for $a\text{\ensuremath{-}}\mathrm{IZO}$ with ${\ensuremath{\mu}}_{\mathrm{max}}=54\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{2}∕\mathrm{V}\phantom{\rule{0.2em}{0ex}}\mathrm{s}$ at $N=1.3\ifmmode\times\else\texttimes\fi{}{10}^{20}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$. The electron transport, thermally activated at $N\ensuremath{\leqslant}{10}^{19}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$, becomes limited by lattice scattering at $N\ensuremath{\approx}{10}^{20}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$ and then by ionized impurity scattering at $N>5\ifmmode\times\else\texttimes\fi{}{10}^{20}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}3}$.
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