Surface morphology and magnetic anisotropy of obliquely deposited Co/Si(111) films

Abstract

We report an investigation on magnetic anisotropy of Co/Si(111) films deposited at oblique incidence. An in-plane uniaxial magnetic anisotropy (UMA) with the easy axis perpendicular to the incident flux plane was observed to superimpose on sixfold magnetocrystalline anisotropy of Co films. We built a total energy model to investigate the magnetization reversal mechanism around hard axis. The simulated value of UMA is Ku=1.7×105 erg/cm3, which is consistent with Kshape=1.1×105 erg/cm3 calculated from scanning tunneling microscope image. This good agreement suggests the in-plane UMA is mainly originated from the shape of the oblique deposited Co stripes.