Effect of substrate temperature on the magnetic properties of epitaxial sputter-grown Co/Pt

Andrei P. Mihai, Allen L. Whiteside, E. J. Canwell, C. H. Marrows, M. J. Benitez, D. McGrouther, S. McVitie, S. McFadzean, T. A. Moore

Applied Physics Letters · 2013 · 17 citations · 22 references

Concepts

Abstract

Epitaxial Co/Pt films have been deposited by dc-magnetron sputtering onto heated C-plane sapphire substrates. X-ray diffraction, the residual resistivity, and transmission electron microscopy indicate that the Co/Pt films are highly ordered on the atomic scale. The coercive field and the perpendicular magnetic anisotropy increase as the substrate temperature is increased from 100–250 °C during deposition of the Co/Pt. Measurement of the domain wall creep velocity as a function of applied magnetic field yields the domain wall pinning energy, which scales with the coercive field. Evidence for an enhanced creep velocity in highly ordered epitaxial Co/Pt is found.

References

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