A Novel Example of X‐Ray‐Radiation‐Induced Chemical Reduction of an Aromatic Nitro‐Group‐Containing Thin Film on SiO₂ to an Aromatic Amine Film

Abstract

Reductive rays: X-ray photoelectron spectroscopy was employed to investigate the chemical change in self-assembled films of 3-(4-nitrophenoxy)-propyltrimethoxysilane (NPPTMS) on silicon (Si/SiO2) wafers upon X-ray irradiation The results indicate conversion of the NO2 group into NH2. In order to confirm this, a self-assembled multilayer of NPPTMS on silicon was subjected to reductive conditions (SnCl2/anhydrous EtOH) to convert the NO2 to the NH2 group. The graphic shows the time-resolved X-ray induced chemical reduction of the thin film on an SiO2 surface.