Preparation of a Protected Triamino Analogue of Cholic Acid and Sequential Incorporation of Amino Acids in Solution and on a Solid Support

Abstract

We have prepared a triamine derivative of cholic acid with protecting groups on the amines that allow sequential amide formation. The triamine was formed from 3 alpha,7 alpha, 12 alpha-trihydroxycholan-24-ol with good stereoselectivity. Sequential removal of the amine protecting groups and amide formation was achieved in high-yielding steps and was performed in solution and on a solid support.