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Formation of Al<sub>4</sub>Cu<sub>9</sub> on the 5 fold Surface of Icosahedral AlPdMn
13
Citations
13
References
2005
Year
EngineeringIcosahedral AlpdmnSolid-state ChemistryCu FilmChemistryChemical DepositionMaterials ScienceInorganic ChemistryMaterials EngineeringAl 4CrystallographyMicrostructureFold SurfaceSurface CharacterizationMaterial AnalysisSurface ChemistrySurface ScienceCondensed Matter PhysicsApplied PhysicsThin FilmsCu 9
The authors report about the formation of Al 4 Cu 9 from a thin Cu film evaporated on the five‐fold surface of icosahedral AlPdMn. By heating up to 350°C Al diffuses from the quasicrystal into the Cu film forming well crystalline Al 4 Cu 9 present in 5 domains rotated by 72° with respect to each other and exposed in the (110) surface. The investigation was performed using Low Energy Electron Diffraction, X‐ray Photoelectron Diffraction and X‐ray Photoelectron Spectroscopy giving information about long range order, local structure and chemical composition.
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