Applied Physics Letters · 2014 · 194 citations · 12 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesThin FilmsMetal-oxide-semiconductor Field-effect TransistorsSemiconductor Device MaterialsSemiconductor SurfacesThin Film Electrical PropertiesThin-film TransistorsWide Band Gap SemiconductorsActivation EnergyAmbipolar Thin-film TransistorsAmbipolar TransportConductivityP-type ConductivitySchottky Barrier ContactsSchottky ContactsTemperature Dependence
The properties of multilayer exfoliated MoTe2 field-effect transistors (FETs) on SiO2 were investigated for channel thicknesses from 6 to 44 monolayers (MLs). All transistors showed p-type conductivity at zero back-gate bias. For channel thicknesses of 8 ML or less, the transistors exhibited ambipolar characteristics. ON/OFF current ratio was greatest, 1 × 105, for the transistor with the thinnest channel, 6 ML. Devices showed a clear photoresponse to wavelengths between 510 and 1080 nm at room temperature. Temperature-dependent current-voltage measurements were performed on a FET with 30 layers of MoTe2. When the channel is turned-on and p-type, the temperature dependence is barrier-limited by the Au/Ti/MoTe2 contact with a hole activation energy of 0.13 eV. A long channel transistor model with Schottky barrier contacts is shown to be consistent with the common-source characteristics.
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