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Electronic structure of a stepped silicon surface
21
Citations
13
References
1976
Year
EngineeringSilicon On InsulatorElectronic StructureSiliceneSurface ReconstructionMaterials SciencePhysicsPerfect SurfaceAtomic PhysicsDouble-layer HeightSemiconductor Device FabricationQuantum ChemistrySolid-state PhysicSurface CharacterizationNatural SciencesSurface AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsFermi LevelStepped Silicon Surface
The surface has an average (111) orientation with up and down steps of a double-layer height. The step edges run along the (110) direction and result in atoms with either one or two dangling bonds. The calculation is carried out in a simple linear-combination-of-atomic-orbitals approach and self-consistency is rudimentarily achieved. Density of states projected at various atoms and electronic charge densities are presented. The Fermi level is found to be lowered by 0.3 eV with respect to the corresponding value for the (111) perfect surface, in good agreement with experiment.
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