Publication | Closed Access
Novel Positive-Tone Chemically Amplified Resists with Photoacid Generator in the Polymer Chains
47
Citations
0
References
2001
Year
EngineeringElectron-beam LithographyOrganic ElectronicsResist MatrixPolymer ChainsChemistryResistorBeam LithographyNanoelectronicsPhotoacid GeneratorPhotopolymer NetworkPolymer ChemistryNanolithography MethodMaterials SciencePhotochemistryHigh SensitivityPhotoelectric MeasurementMicroelectronicsSuccessful SynthesisPolymer ScienceApplied PhysicsConjugated PolymerOptoelectronics
The successful synthesis of a series of positive-tone chemically amplified (CA) resists, with photoacid generating units incorporated in the resist matrix, is reported. The resists are found to exhibit excellent film formation behavior and an extremely high sensitivity, which makes them potential candidates for low-voltage electron beam (EB) lithography (a typical pattern is shown in the Figure).