Fabrication of flexible superhydrophobic films by lift-up soft-lithography and decoration with Ag nanoparticles

Abstract

Superhydrophobic films with excellent flexibility have been fabricated by combining the lift-up soft-lithography technique and chemical reduction of [Ag(NH(3))(2)](+) ions to Ag nanoparticles (NPs) on the surface of silica spheres which are patterned on the polydimethylsiloxane (PDMS) films. Scanning electron microscopy (SEM) images reveal the presence of raspberry-like hierarchical structures on the PDMS films. The influence of the amount of Ag NPs and the size of the silica spheres on the wettability of the soft films is investigated carefully. Because PDMS films are elastomeric materials, our superhydrophobic films offer great flexibility. The resulting films can be easily transferred from one substrate surface to another without destroying their superhydrophobicity. These flexible and superhydrophobic films can be used repeatedly to satisfy a wide range of applications.