Publication | Closed Access
Characteristics of multi-element (ZrTaNbTiW)N films prepared by magnetron sputtering and plasma based ion implantation
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Citations
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References
2013
Year
Materials EngineeringMaterials ScienceIon ImplantationEngineeringNanoelectronicsOxide ElectronicsN FilmsApplied PhysicsMagnetron SputteringThin FilmsPlasma ProcessingThin Film Processing
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