Photoluminescent Silicon Clusters in Oriented Hexagonal Mesoporous Silica Film

Abstract

The synthesis of ca. 1 nm diameter photoluminescent silicon nanoclusters in the surfactant-containing channels of a free-standing, oriented hexagonal mesoporous silica film is reported. The preparation involves an exceptionally mild disilane CVD procedure (see Fig.), during which the surfactants are intentionally retained within the channels during CVD, thus restricting the space in which the silicon clusters nucleate and grow.