Advanced Materials · 1999 · 87 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials ChemistryNanomaterialsThin FilmsCluster ChemistryNanostructured Electronic MaterialsSemiconductor NanomaterialsSilicon MaterialsThin Film Surface MorphologyNanostructured SiliconPhotoluminescent MaterialsSiliconSilicon DioxideSilicon Nanostructures
The synthesis of ca. 1 nm diameter photoluminescent silicon nanoclusters in the surfactant-containing channels of a free-standing, oriented hexagonal mesoporous silica film is reported. The preparation involves an exceptionally mild disilane CVD procedure (see Fig.), during which the surfactants are intentionally retained within the channels during CVD, thus restricting the space in which the silicon clusters nucleate and grow.