Direct Patterning of Protein‐ and Cell‐Resistant Polymeric Monolayers and Microstructures

Abstract

A simple technique is introduced to pattern proteins and cells with precise control over the feature topography (see Figure, white bar indicates 20 μm). The technique uses a combination of a molding process and a novel poly(ethylene glycol) copolymer to form topographical features ranging from polymeric monolayers to microstructures via simple modifications to the fabrication process.