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Nonlinear Phonon Propagation in Fused Silica below 1 K

149

Citations

7

References

1973

Year

Abstract

Phonon pulse propagation has been studied in fused silica at frequencies between 0.4 and 2.0 GHz for temperatures as low as 0.1 K. An increase in attenuation, observed as the incident acoustic intensity is decreased, is attributed to resonant scattering by two-level "tunneling states" intrinsic to glasses.

References

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