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Epitaxy of <i>m</i> ‐plane ZnO on (112) LaAlO<sub>3</sub> substrate
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Citations
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References
2009
Year
Oxide HeterostructuresMaterials ScienceEpitaxial GrowthEngineeringCrystal Growth TechnologyOxide ElectronicsOptoelectronic MaterialsApplied PhysicsSurface ScienceX‐ray DiffractionZno ∥Thin FilmsPulsed Laser DepositionAbstract Heteroepitaxial GrowthMolecular Beam Epitaxy
Abstract Heteroepitaxial growth of non‐polar m ‐plane (10 $ \bar 1 $ 0) ZnO has been demonstrated on (112) LaAlO 3 single crystal substrates using the pulsed laser deposition method. X‐ray diffraction, reflection high energy electron diffraction, and cross‐sectional transmission electron microscopy with selected‐area diffraction, have been used to characterize the structural properties of deposited ZnO films. The epitaxial relationship between ZnO and LAO is shown to be (10 $ \bar 1 $ 0) ZnO ∥ (112) LAO , (11 $ \bar 2 $ 0) ZnO ∥ ( $ \bar 1 $ $ \bar 1 $ 1) LAO and [0001] ZnO ∥ [ $ \bar 1 $ 10] LAO . (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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