Journal of The Electrochemical Society · 1976 · 29 citations · 0 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationMaterials ChemistryMechanical Behavior Of MaterialsChemical Vapor DepositionMicrostructure ControlSilicon MaterialsThin-film DepositionChemical Vapor Deposition CoatingsChemical Vapor Deposition MaterialsNitrides DepositionSilicon Chemical Vapor DepositionSilicon NitrideThermal Expansion
Abstract : Experimental work during the past year has established the basic processing outlines for the deposition of crystalline alpha-Si3N4 plates and dome geometries. Preliminary correlations between critical processing variables and microstructure have been established. Property evaluations of deposits include: flexure strength, Young's moduli, thermal expansion, electromagnetic transmittance and reflectance, microhardness and fracture toughness deduced from identation and grooved double-cantilever beam experiments. (Author)