Optical properties of oxygen precipitates and dislocations in silicon

Abstract

Photoluminescence (PL) and deep level transient spectroscopy (DLTS) measurements were used to study the origin of optical emissions in the 0.8–1.0 eV region of selected oxygen precipitated and dislocated silicon samples. It was shown that the D1 band, present in both types of samples, is the convolution of different sub-bands, narrowly spaced between 0.802 and 0.820 eV. The emission at 0.807 eV, assigned in the literature to dislocations, was found only in samples where dislocations were intentionally generated by plastic deformation or induced by the clustering of self-interstitials generated during the growth of oxide precipitates. A comparison of the results of PL, DLTS, and optical DLTS measurements allows the assignment of levels involved in the radiative recombination processes.