Preparation and properties of sputtered bismuth oxide films

Abstract

Apparatus is described which is capable of producing thin films of bismuth oxide with refractive index 2.50 and index of absorption 0.03 (both measured at a wavelength of 5500 Å). The results described show the necessity for close control of the argon: oxygen ratio in the sputtering discharge, and a simple flowmeter is described that can provide such control.