Magnetic and structural properties of dual ion beam sputtered pure iron films

Abstract

Pure Iron films have been prepared using Dual Ion Beam Sputtering DIBS apparatus, and the magnetic properties dependence on the crystal structure has been investigated. In this study, the preparation parameters were substrate temperature Ts, acceleration voltage for Ar ions which sputter the target Vacc., and acceleration voltage for assistant Ar ions onto the surface of growing films Vsub.acc.. With an increace in Vacc., the preferred orientation changed from the