Publication | Open Access
Elastic and surface energies: Two key parameters for CdSe quantum dot formation
29
Citations
19
References
2006
Year
EngineeringSurface EnergiesStrained Cdse LayerCdse LayerColloidal NanocrystalsSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorQuantum DotsQuantum MaterialsEpitaxial GrowthMaterials SciencePhysicsCrystalline DefectsNanotechnologySemiconductor MaterialRelaxation MechanismKey ParametersNanocrystalline MaterialNanomaterialsSurface ScienceCondensed Matter PhysicsApplied PhysicsThin Films
The two-dimensional–three-dimensional transition of a strained CdSe layer on (001) ZnSe induced by the use of amorphous selenium is studied. To precisely control the thickness of the CdSe layer, atomic layer epitaxy growth mode is used. Atomic force microscopy and reflection high-energy electron diffraction measurements reveal the formation of CdSe islands when 3 ML (monolayers) of CdSe, corresponding to the critical thickness, are deposited. When only 2.5 ML of CdSe are deposited another relaxation mechanism is observed, leading to the appearance of strong undulations on the surface. For a 3 ML thick CdSe layer, transmission electron microscopy images indicate that the formation of the islands occurs only after the amorphous selenium desorption.
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