Publication | Closed Access
Growth and properties of single-phase γ-In2Se3 thin films on (111) Si substrate by AP-MOCVD using H2Se precursor
18
Citations
14
References
2007
Year
Materials ScienceSi SubstrateEngineeringSurface ScienceApplied PhysicsH2se PrecursorThin Film Process TechnologyThin FilmsEpitaxial GrowthChemical Vapor DepositionThin Film Processing
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