A novel photo-sensitized polymerization of pyrrole

Hiroshi Segawa, Takeo Shimidzu, Kenichi Honda

Journal of the Chemical Society Chemical Communications · 1989 · 110 citations · 0 references

Concepts

Abstract

A novel photo-sensitized polymerization of pyrrole by the use of tris(2,2′-bipyridine)ruthenium(II) as a photo-sensitizer has been investigated in aqueous solution and in polymer matrix for the fabrication of fine conducting polymer patterns.