Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias - Concepedia

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Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias

29

Citations

9

References

2001

Year

Pascal Tristant, Zhenfeng Ding, Q.B. Trang Vinh, H. Hidalgo, J. L. Jauberteau, J. Desmaison, Chong Dong

Thin Solid Films

Materials ScienceAluminum Oxide FilmsElectrical EngineeringEngineeringMicrowave PlasmaApplied PhysicsMicrowave DiagnosticsGas Discharge PlasmaPlasma ApplicationPlasma ProcessingPlasma DiagnosticsRf Bias

References

	Year	Citations

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