Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris(t-butyl-3-oxo-butanoato)iron(III) - Concepedia

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Thin films of iron oxide by low pressure MOCVD using a novel precursor: tris(t-butyl-3-oxo-butanoato)iron(III)

55

Citations

14

References

2003

Year

K. Shalini, G. N. Subbanna, Srinivasan Chandrasekaran, S. A. Shivashankar

Thin Solid Films

Materials ScienceEngineeringOxide ElectronicsSurface ScienceIron OxideVacuum DeviceChemistryThin FilmsChemical Vapor DepositionLow Pressure MocvdThin Film Processing

References

	Year	Citations

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