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Ultraviolet and visible photoresponse properties of n-ZnO∕p-Si heterojunction
188
Citations
22
References
2007
Year
Optical MaterialsEngineeringPhoto-electrochemical CellOptoelectronic DevicesSilicon On InsulatorPhotoelectrochemistryPhotovoltaicsSemiconductorsElectronic DevicesPhotodetectorsOptical PropertiesCompound SemiconductorElectrical EngineeringVisible PhotonsOxide ElectronicsOptoelectronic MaterialsPhotoelectric MeasurementLight IlluminationVisible Photoresponse PropertiesApplied PhysicsThin FilmsOptoelectronicsShallow Defect LevelSolar Cell Materials
A n-ZnO∕p-Si thin film heterojunction has been fabricated by a low cost sol-gel technique. The wavelength dependent photoresponse properties of the heterojunction is investigated in detail by studying the effect of light illumination on current-voltage (I-V) characteristics, photocurrent, and photocapacitance spectra at room temperature. It shows good diode characteristics with IF∕IR=3.4×103 at 4V and reverse leakage current density of 7.6×10−5Acm−2 at −5V. From the photocurrent spectra, it is observed that the visible photons are absorbed in the depleted p-Si under reverse bias conditions, while ultraviolet (UV) photons are absorbed in the depleted n-ZnO under positive bias conditions. This indicates that such a sol-gel n-ZnO∕p-Si thin film heterojunction can be used to sense both UV and visible photons though the photoresponse for UV is much slower than that of visible. The photocapacitance measurements suggest the presence of a shallow defect level in the sol-gel derived ZnO film which acts as an electron trap at ∼0.16eV below the conduction band.
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