Diamond growth on Fe-Cr-Al alloy by H2-plasma enhanced graphite etching

Abstract

Without intermediate layer and surface pretreatment, adherent diamond films with high initial nucleation density have been deposited on Fe–15Cr–5Al (wt. %) alloy substrate. The deposition was performed using microwave hydrogen plasma enhanced graphite etching in a wide temperature range from 370to740°C. The high nucleation density and growth rate of diamond are primarily attributed to the unique precursors used (hydrogen plasma etched graphite) and the chemical nature of the substrate. The improvement in diamond adhesion to steel alloys is ascribed to the important role played by Al, mitigation of the catalytic function of iron by suppressing the preferential formation of loose graphite intermediate phase on steel surface.