Inelastic scattering rate for electrons in thin aluminum films determined from the minimum frequency for microwave stimulation of superconductivity

Abstract

A new method for determination of the inelastic scattering rate for electrons in thin films is presented, using the minimum frequency for microwave enhancement of the critical pair-breaking current. Measurements on clean aluminum films with thickness between 144 and 4 nm yield excellent agreement with predictions of Abrahams et al. for electron-electron scattering.