Applied Physics Letters · 1984 · 71 citations · 5 references
Materials ScienceInterfacial BondingIon ImplantationEngineeringCrystalline DefectsAdhesive MaterialSurface ScienceApplied PhysicsSubsequent IrradiationInterfacial PhenomenaThin-film Adhesion ChangesThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film Processing
The adhesion of thin films of gold, sputter deposited onto silicon, is shown to be improved by subsequent irradiation with 5–30-keV electrons. The similarities between electron and heavy ion irradiation effects suggest a common (electronic) origin for the change in interfacial bonding.
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