Publication | Open Access
Ferroelectric photovoltaic properties in doubly substituted (Bi0.9La0.1)(Fe0.97Ta0.03)O3 thin films
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Citations
27
References
2015
Year
Materials ScienceChemical EngineeringInorganic ElectronicsEngineeringBlfto Thin FilmsPlanar ElectrodesFerroelectric ApplicationOxide ElectronicsOxide SemiconductorsApplied PhysicsFilm Capacitor StructuresThin Film Process TechnologyThin FilmsFunctional MaterialsO3 Thin FilmsThin Film Processing
Doubly substituted [Bi0.9La0.1][Fe0.97Ta0.03]O3 (BLFTO) films were fabricated on Pt/TiO2/SiO2/Si substrates by pulsed laser deposition. The ferroelectric photovoltaic properties of ZnO:Al/BLFTO/Pt thin film capacitor structures were evaluated under white light illumination. The open circuit voltage and short circuit current density were observed to be ∼0.20 V and ∼1.35 mA/cm2, respectively. The band gap of the films was determined to be ∼2.66 eV, slightly less than that of pure BiFeO3 (2.67 eV). The PV properties of BLFTO thin films were also studied for various pairs of planar electrodes in different directions in polycrystalline thin films.
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