Publication | Closed Access
Influence of Mn doping on domain wall motion in Pb(Zr0.52Ti0.48)O3 films
54
Citations
35
References
2011
Year
Materials ScienceMultiferroicsEngineeringThreshold FieldCrystalline DefectsFerroelectric ApplicationOxide ElectronicsO3 FilmsMn-doped Pbzr0.52ti0.48o3Applied PhysicsCondensed Matter PhysicsFerroelectric MaterialsPzt FilmsSemiconductor MaterialDomain Wall MotionThin FilmsMolecular Beam EpitaxyEpitaxial Growth
Mn-doped PbZr0.52Ti0.48O3 (PZT) films were utilized to study the effect of acceptor dopant concentration on the mobility of ferroelectric domain walls. For chemical solution deposited PZT films between ∼0.5–2μm in thickness doped with 1–2mol.% Mn, the low field relative permittivity remained between 900 and 1000. With increasing Mn concentration, a threshold field developed in the ac field dependence of the relative permittivity. Furthermore, both the reversible and irreversible Rayleigh constants decreased. These observations are consistent with the possibility that MnTi’–VO•• (or MnTi’’–VO••) defect dipoles act as strong pinning centers.
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