Effect of Si content on the properties of TiAl–Si–N films deposited by closed field unbalanced magnetron sputtering with vertical magnetron sources - Concepedia

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Effect of Si content on the properties of TiAl–Si–N films deposited by closed field unbalanced magnetron sputtering with vertical magnetron sources

41

Citations

13

References

2005

Year

Gwang Seok Kim, Bom Sok Kim, Sang Yul Lee, Jun Hee Hahn

Thin Solid Films

Materials ScienceEngineeringSurface ScienceApplied PhysicsTial–si–n FilmsVertical Magnetron SourcesThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film ProcessingSi Content

References

	Year	Citations

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