Electroless cobalt deposition from a glycinate solution using morpholine borane as a reducing agent

Abstract

Electroless cobalt films were deposited from a neutral pH glycinate solution without additives using morpholine borane (MB) as a reducing agent. The rate of deposition rises with increase in concentration of solution components (Co ions, MB and glycine), and pH. The efficiency of cobalt discharge increases when the deposition is performed from the Co(II) complex with glycine. XPS data indicate that boron and oxygen are incorporated into the cobalt films. Two forms of boron (elemental and its oxide) were detected in the electrolessly deposited cobalt films.