Structure and electrical properties of HfO2 high-k films prepared by pulsed laser deposition on Si (100) - Concepedia

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Structure and electrical properties of HfO2 high-k films prepared by pulsed laser deposition on Si (100)

32

Citations

20

References

2008

Year

Hao Wang, Y. Wang, Ji Feng, C. Ye, Bo-Yao Wang, H. B. Wang, Quan Li, Yong Jiang, Anping Huang, Z. S. Xiao

Applied Physics A

Materials ScienceMaterials EngineeringElectrical EngineeringEpitaxial GrowthEngineeringApplied PhysicsHfo2 High-k FilmsLaser DepositionThin FilmsPulsed Laser DepositionMolecular Beam EpitaxyElectrical PropertiesOptoelectronicsChemical Vapor DepositionSilicon On Insulator

References

	Year	Citations

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