Evidence for magnetism due to oxygen vacancies in Fe-doped HfO2 thin films

Abstract

Fe-doped HfO2 thin films are room temperature ferromagnetic. In comparison with results of the undoped HfO2 films, it seems that the Fe doping is not the main cause for the ferromagnetism but only acts as a catalyst. Experimental results of oxygen annealing and vacuum heat treatments have proven that in this family of compounds, magnetism might originate from oxygen vacancies or defects. Removing oxygen enhances the magnetic moment, while reversibly filling up oxygen vacancies can destroy the ferromagnetic ordering of the system.